Ion Implantation
Ion implantation introduces dopant atoms into a solid material by accelerating ions through an electric field and embedding them beneath the surface, enabling precise control of dopant concentration and depth profile. As a hard skill it requires selecting ion species, energy, and dose, modeling the implant range with tools such as SRIM, and planning post-implantation annealing to activate dopants and repair lattice damage. Battery researchers apply ion implantation to modify the surface chemistry and ionic conductivity of electrode materials and solid electrolytes, and to study radiation-damage effects in materials intended for nuclear or space applications.
