Chemical/Physical Vapor Deposition (CVD)
Chemical and physical vapor deposition (CVD and PVD) deposit thin solid films onto substrates from the gas phase — CVD through chemical reaction of precursor gases at the surface, and PVD through physical processes such as sputtering or evaporation. As a hard skill it requires selecting the deposition method and process parameters (pressure, temperature, power, gas flow) for the target material, verifying film thickness and composition post-deposition, and troubleshooting uniformity and adhesion issues. Battery researchers apply CVD and PVD to deposit electrode coatings, solid electrolyte films, and protective interlayers for next-generation cell architectures.
