Atomic Layer Deposition (ALD)
Atomic layer deposition (ALD) grows ultrathin, conformal films one atomic monolayer at a time by alternating self-limiting surface reactions, enabling precise control of film thickness, composition, and uniformity on complex 3D structures. As a hard skill it requires selecting precursor chemistries and process temperatures, verifying growth per cycle with ellipsometry or X-ray reflectometry, and managing precursor handling and by-product removal in research or pilot reactors. Battery researchers apply ALD to deposit protective coatings on cathode particles and solid electrolytes, passivating surfaces that would otherwise react with liquid electrolytes and degrade cycle life.
